ΒΆ Raith 100 E-beam EBPG
| Location | Cleanroom (HL612) |
|---|---|
| Functions | Electron beam lithography (>60 nm) |
| Specimen | ~ 15x15 mm samples, standard wafer thickness |
| Manufacturer | Tescan & Raith |
| Responsible | Sander van Leeuwen |
her;kjhwer;ghkerag;lerk
| Location | Cleanroom (HL612) |
|---|---|
| Functions | Electron beam lithography (>60 nm) |
| Specimen | ~ 15x15 mm samples, standard wafer thickness |
| Manufacturer | Tescan & Raith |
| Responsible | Sander van Leeuwen |
her;kjhwer;ghkerag;lerk