¶ Harrick Plasma Cleaner
| Location | Cleanroom (HL612) |
|---|---|
| Functions | Cleans surfaces |
| Specimen | 3 inch wafer or smaller, bare Si, SiO2 or glass. All exceptions should be discussed. |
| Manufacturer | Harrick Plasma |
| Responsible | Luc Wigbout |
¶ Manual
Clean the glass sample tray with acetone and isopropanol and load samples on the tray.
Start the vacuum pump while holding the door, make sure black valve is pointing down.
Wait untill the chamber is pumped down to below 100mTorr.
Rotate the black valve to the needle valve. If needle valve is open the pressure should go to previous setpoint (check the logbook). Change the setpoint if you need to and wait for pressure to stabilize.
Set RF (low, mid or high) and when the plasma ignites, start your timer.
Turn off RF when timer finishes.
Close black valve (valve pointing down).
Pump down to below 100mTorr to make sure etch products are removed from the chamber.
Stop the vacuum pump and turn black valve to the right to vent.
Vent slowly to avoid samples flying around in the chamber
Close black valve (valve pointing down) and close the door. Write in the logbook: name, date, sample, process conditions, any remarks.
¶ Typical cleaning process
- 500 - 900mTorr
- 1 - 3 minutes
- High RF